DocumentCode
2082171
Title
A 2.5-dB Insertion Loss, DC-60 GHz CMOS SPDT Switch in 45-nm SOI
Author
Parlak, Mehmet ; Buckwalter, James F.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of California, La Jolla, CA, USA
fYear
2011
fDate
16-19 Oct. 2011
Firstpage
1
Lastpage
4
Abstract
This paper presents a single-pole double-throw (SPDT), transmit/receive (T/R) switch operating from DC to 60 GHz. The SPDT switch is based on a series-shunt circuit with broadband input and output matching circuits and is implemented in a partially-depleted, 45-nm silicon-on-insulator (SOI) process. A buried oxide (BOX) layer is demonstrated to minimize substrate coupling. The switch exhibits a measured insertion loss of less than 1.7 dB at 45 GHz and less than 2.5 dB at 60 GHz with an isolation of greater than 25 dB at 45 GHz. To our knowledge, this is the lowest insertion loss demonstrated for an SPDT switch at 60 GHz in a CMOS process. With a control voltage of 1.2 V, the measured P1dB and IIP3 are 7.1 dBm and 18.2 dBm, respectively. The active chip area is 0.18×0.22 mm2.
Keywords
CMOS integrated circuits; field effect MIMIC; microwave switches; silicon-on-insulator; CMOS SPDT switch; buried oxide layer; frequency 60 GHz; loss 2.5 dB; series-shunt circuit; silicon-on-insulator; single-pole double-throw switch; size 45 nm; substrate coupling; transmit-receive switch; voltage 1.2 V; CMOS integrated circuits; CMOS technology; Insertion loss; Loss measurement; Substrates; Switches; Switching circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2011 IEEE
Conference_Location
Waikoloa, HI
ISSN
1550-8781
Print_ISBN
978-1-61284-711-5
Electronic_ISBN
1550-8781
Type
conf
DOI
10.1109/CSICS.2011.6062463
Filename
6062463
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