DocumentCode :
2084869
Title :
Some features of Monte-Carlo methods usage for IC manufacturing technological operation simulation
Author :
Tesluk, Vasyl ; Granat, Petro ; Korbetskyy, Orest ; Koval, Volodymyr Y.
Author_Institution :
Lviv Polytech. Nat. Univ., Ukraine
fYear :
2001
fDate :
12-17 Feb. 2001
Firstpage :
132
Abstract :
The mathematical models, based on Monte-Carlo method were developed for taking for account decreasing of geometrical sizes of integral devices.
Keywords :
Monte Carlo methods; semiconductor process modelling; IC manufacturing; Monte Carlo method; mathematical model; technological operation simulation; Application specific integrated circuits; Etching; Histograms; Integrated circuit modeling; Ion implantation; Kernel; Mathematical model; Solid modeling; Testing; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
CAD Systems in Microelectronics, 2001. CADSM 2001. Proceedings of the 6th International Conference. The Experience of Designing and Application of
Conference_Location :
Lviv-Slavsko, Ukraine
Print_ISBN :
966-553-079-8
Type :
conf
DOI :
10.1109/CADSM.2001.975783
Filename :
975783
Link To Document :
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