• DocumentCode
    2085674
  • Title

    Nano-photolithography using a visible light based on the nonadiabatic near-field photochemical reaction

  • Author

    Kawazoe, T. ; Haga, Ryoichi ; Ohtsu, Motoichi

  • Author_Institution
    SORST, Japan Sci. & Technol. Agency, Tokyo
  • fYear
    2004
  • fDate
    21-21 May 2004
  • Firstpage
    536
  • Lastpage
    537
  • Abstract
    We applied nonadiabatic near-field photochemical reaction to the photolithography. The optical near field with the steep spatial gradient of optical power activates the unique photochemical reaction and enables nanometric patterning even by using visible light
  • Keywords
    nanopatterning; optical fabrication; photochemistry; photolithography; nanometric patterning; nanophotolithography; nonadiabatic near-field photochemical reaction; visible light;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics Conference, 2004. (IQEC). International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    1-55752-778-4
  • Type

    conf

  • Filename
    1366880
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2085674