DocumentCode :
2089170
Title :
Effective utilization (Ue) - a breakthrough performance indicator for machine efficiency improvement
Author :
Lopez, Peter ; Terry, Adam ; Daniely, David ; Kalir, Adar
Author_Institution :
Intel Corp., Rio Rancho, NM
fYear :
2005
fDate :
13-15 Sept. 2005
Firstpage :
63
Lastpage :
66
Abstract :
In today´s high stakes semiconductor industry, cost accounting demands high machine utilization and world class throughput time. The greater the utilization of capital equipment, the greater the return on investment [W. Hopp et al., 1996]. One of the major challenges facing most manufacturing facilities has been the inability to sustain world class equipment utilization and factory throughput time [J. Black et al., 2002]. This paper details how, through a breakthrough system called effective utilization (Ue), major advances in achieving higher predictable utilization and increased WIP velocity were made in both 200 mm and 300 mm Intel manufacturing facilities
Keywords :
cost accounting; integrated circuit manufacture; production equipment; production facilities; work in progress; Intel manufacturing facilities; WIP velocity; capital equipment utilization; cost accounting; effective utilization; factory throughput time; machine efficiency improvement; machine utilization; performance indicator; semiconductor industry; world class equipment utilization; world class throughput time; Automatic control; Control systems; Cost accounting; Electric breakdown; Electronics industry; Inventory control; Logic arrays; Manufacturing; Production facilities; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-9143-8
Type :
conf
DOI :
10.1109/ISSM.2005.1513297
Filename :
1513297
Link To Document :
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