DocumentCode :
2089703
Title :
Near field optical spectroscopy of GaN/AlN quantum dots
Author :
Neogi, A. ; Morkoc, H. ; Tackeuchi, A. ; Kuroda, T. ; Ohtsu, M. ; Kawazoe, T.
Author_Institution :
Dept. of Phys., North Texas Univ., Denton, TX
fYear :
2004
fDate :
21-21 May 2004
Firstpage :
832
Lastpage :
833
Abstract :
GaN dots on AlN layers were grown on sapphire substrates by rf-nitrogen plasma molecular beam epitaxy. Size control of QDs by strain modification using various growth techniques is demonstrated to achieve emission energies ranging from 2.5 eV to 3.9 eV . In self-organized GaN QDs, the quantum confinement effect observed in the "classical" GaAs-based QD or QW, is offset by the large piezoelectric fields resulting in a red-shift of the ground state optical transition below the bulk bandgap by about 0.5-1.2 eV
Keywords :
III-V semiconductors; aluminium compounds; energy gap; gallium compounds; molecular beam epitaxial growth; photoluminescence; piezoelectricity; red shift; self-assembly; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; time resolved spectra; wide band gap semiconductors; 2.5 to 3.9 eV; Al2O3; GaN-AlN; GaN/AlN quantum dots; bandgap; ground state optical transition; near field optical spectroscopy; piezoelectric fields; quantum confinement effect; red-shift; rf-nitrogen plasma molecular beam epitaxy; self-organization; strain modification;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics Conference, 2004. (IQEC). International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-55752-778-4
Type :
conf
Filename :
1367024
Link To Document :
بازگشت