Title :
Systematic method to optimize conditioning process through real time plasma monitoring
Author :
Baek, Kye Hyun ; Kim, Yong Jin ; Min, Gyung Jin ; Kang, Chang Jin ; Cho, Han Ku ; Moon, Joo Tae
Author_Institution :
Semicond. R&D Center, Samsung Electron., Co. Ltd., Gyeonggi-Do
Abstract :
A systematic method to optimize conditioning processes is introduced. By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each chamber condition is determined quickly. Through this real time analysis and rapid action, total time to optimize the conditioning process is significantly reduced
Keywords :
integrated circuit manufacture; plasma diagnostics; plasma materials processing; sputter etching; chamber conditions; conditioning process; optical emission spectroscopy; real time analysis; real time plasma monitoring tools; self-excited electron resonance spectroscopy; systematic method; Cleaning; Condition monitoring; Electrons; Optimization methods; Plasma applications; Plasma measurements; Plasma properties; Real time systems; Semiconductor device modeling; Spectroscopy;
Conference_Titel :
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-9143-8
DOI :
10.1109/ISSM.2005.1513315
