DocumentCode
2089744
Title
A multivariate statistical analysis of tool parameters to improve an erase failure of a flash memory device
Author
Miwa, Kazuhiro ; Watanabe, Kazuhiro ; Takeishi, Kumiko ; Kobayashi, Toru ; Imaoka, Kazunori
Author_Institution
Spansion LLC, Fukushima
fYear
2005
fDate
13-15 Sept. 2005
Firstpage
132
Lastpage
135
Abstract
A multivariate statistical analysis of tool parameters in a stack gate etching was performed to identify variables relating to an erase failure of a flash memory device. A statistical modeling of the extracted parameters was also done to predict (simulate) yields in an erase test. One of extracted parameters was controlled experimentally to improve the erase failure based on the analysis. In the result we found a possibility to improve the erase yield by controlling a tool parameter in the etching process
Keywords
etching; flash memories; integrated circuit testing; statistical analysis; erase failure; erase test; flash memory device; multivariate statistical analysis; stack gate etching; statistical modeling; tool parameters; Etching; Failure analysis; Flash memory; Nonvolatile memory; Predictive models; Production; Radio frequency; Statistical analysis; Testing; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Conference_Location
San Jose, CA
Print_ISBN
0-7803-9143-8
Type
conf
DOI
10.1109/ISSM.2005.1513316
Filename
1513316
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