• DocumentCode
    2089744
  • Title

    A multivariate statistical analysis of tool parameters to improve an erase failure of a flash memory device

  • Author

    Miwa, Kazuhiro ; Watanabe, Kazuhiro ; Takeishi, Kumiko ; Kobayashi, Toru ; Imaoka, Kazunori

  • Author_Institution
    Spansion LLC, Fukushima
  • fYear
    2005
  • fDate
    13-15 Sept. 2005
  • Firstpage
    132
  • Lastpage
    135
  • Abstract
    A multivariate statistical analysis of tool parameters in a stack gate etching was performed to identify variables relating to an erase failure of a flash memory device. A statistical modeling of the extracted parameters was also done to predict (simulate) yields in an erase test. One of extracted parameters was controlled experimentally to improve the erase failure based on the analysis. In the result we found a possibility to improve the erase yield by controlling a tool parameter in the etching process
  • Keywords
    etching; flash memories; integrated circuit testing; statistical analysis; erase failure; erase test; flash memory device; multivariate statistical analysis; stack gate etching; statistical modeling; tool parameters; Etching; Failure analysis; Flash memory; Nonvolatile memory; Predictive models; Production; Radio frequency; Statistical analysis; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-9143-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2005.1513316
  • Filename
    1513316