• DocumentCode
    2089899
  • Title

    Virtual metrology: a solution for wafer to wafer advanced process control

  • Author

    Chen, PingHsu ; Wu, Sunny ; Lin, Junshien ; Ko, Francis ; Lo, Henry ; Wang, Jean ; Yu, C.H. ; Liang, M.S.

  • Author_Institution
    Taiwan Semicond. Manuf. Co. Ltd., Hsin-Chu, Taiwan
  • fYear
    2005
  • fDate
    13-15 Sept. 2005
  • Firstpage
    155
  • Lastpage
    157
  • Abstract
    Virtual metrology (VM) is a novel technology to predict wafer performance from tool slate variables. Virtual metrology can enable wafer to wafer control without additional real metrology.
  • Keywords
    integrated circuit manufacture; integrated circuit measurement; process control; size control; advanced process control; tool slate variables; virtual metrology; wafer performance; wafer-to-wafer process control; Databases; Frequency; Metrology; Plasma applications; Plasma chemistry; Plasma density; Plasma temperature; Process control; Production; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
  • Print_ISBN
    0-7803-9143-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2005.1513322
  • Filename
    1513322
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2089899