DocumentCode :
2090383
Title :
Device design of partial-SOI SJ-LDMOS with n type charge islands
Author :
Tang Tang
Author_Institution :
Res. Inst. of Electron. Sci. & Technol., UESTC, Chengdu, China
fYear :
2013
fDate :
24-25 Oct. 2013
Firstpage :
351
Lastpage :
354
Abstract :
In this paper, addressed SOI SJ-LDMOS high voltage devices, from the beginning of conventional SOI SJ-LDMOS structure, the charge balance effect, the lateral and vertical breakdown voltage theory, self-heating effect and the new device structure are researched. Based on the above aspects, a novel charge-mode SOI SJ-LDMOS high voltage device structure is proposed, and some simulation experiment results are obtained from the novel device. Compared with the 89.5V of conventional structure, the breakdown voltage of the new device structure increased to 212.5V, the value increased by 137.4%.
Keywords :
MIS devices; heating; power semiconductor devices; semiconductor device breakdown; silicon-on-insulator; charge balance effect; device design; high voltage device; lateral breakdown voltage theory; n-type charge islands; partial SOI SJ-LDMOS; self-heating effect; silicon-on-insulator; superjunction laterally diffused metal oxide semiconductor; vertical breakdown voltage theory; voltage 212.5 V; Breakdown voltage; Dielectrics; Electric breakdown; Electric fields; Electric potential; Silicon; Substrates; SOI; Super Junction; breakdown voltage; charge balance; self-heating effect;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Circuits and System Technology (MMWCST), 2013 International Workshop on
Conference_Location :
Chengdu
Type :
conf
DOI :
10.1109/MMWCST.2013.6814651
Filename :
6814651
Link To Document :
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