Title :
Device design of partial-SOI SJ-LDMOS with n type charge islands
Author_Institution :
Res. Inst. of Electron. Sci. & Technol., UESTC, Chengdu, China
Abstract :
In this paper, addressed SOI SJ-LDMOS high voltage devices, from the beginning of conventional SOI SJ-LDMOS structure, the charge balance effect, the lateral and vertical breakdown voltage theory, self-heating effect and the new device structure are researched. Based on the above aspects, a novel charge-mode SOI SJ-LDMOS high voltage device structure is proposed, and some simulation experiment results are obtained from the novel device. Compared with the 89.5V of conventional structure, the breakdown voltage of the new device structure increased to 212.5V, the value increased by 137.4%.
Keywords :
MIS devices; heating; power semiconductor devices; semiconductor device breakdown; silicon-on-insulator; charge balance effect; device design; high voltage device; lateral breakdown voltage theory; n-type charge islands; partial SOI SJ-LDMOS; self-heating effect; silicon-on-insulator; superjunction laterally diffused metal oxide semiconductor; vertical breakdown voltage theory; voltage 212.5 V; Breakdown voltage; Dielectrics; Electric breakdown; Electric fields; Electric potential; Silicon; Substrates; SOI; Super Junction; breakdown voltage; charge balance; self-heating effect;
Conference_Titel :
Microwave and Millimeter Wave Circuits and System Technology (MMWCST), 2013 International Workshop on
Conference_Location :
Chengdu
DOI :
10.1109/MMWCST.2013.6814651