DocumentCode :
2090940
Title :
Applied factory physics study on semiconductor assembly and test manufacturing
Author :
Li, Na ; Zhang, Lawrence ; Zhang, Mike ; Zheng, Li
Author_Institution :
Dept of Ind. Eng., Tsinghua Univ., Beijing
fYear :
2005
fDate :
13-15 Sept. 2005
Firstpage :
307
Lastpage :
310
Abstract :
Cycle time is an important indicator for measuring able performance. Sometimes, we may need to lower the WIP level to reduce cycle time; however, too much WIP reduction may lead to unexpected station starvation. We extend the principles of factory physics, and develop a methodology called O_L graph, which integrates Little´s Law and the operation curve to quantify the interdependency among operations factors like OEE, cycle time, throughput, WIP level, etc.. The methodology has been implemented at Intel Shanghai to set the baseline for chipset assembly and test factory operations and to help us identify opportunities for improvement. A cycle time and WIP level reduction of 10% has been achieved
Keywords :
assembling; graph theory; integrated circuit manufacture; production testing; work in progress; Intel Shanghai; Little Law; O_L graph; applied factory physics; chipset assembly; cycle time reduction; fab performance measurement; semiconductor assembly; station starvation; test factory operations; work in progress; work-in-progress level reduction; Assembly; Physics; Production facilities; Queueing analysis; Semiconductor device manufacture; Semiconductor device measurement; Semiconductor device testing; Tellurium; Throughput; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-9143-8
Type :
conf
DOI :
10.1109/ISSM.2005.1513364
Filename :
1513364
Link To Document :
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