DocumentCode
2092251
Title
Challenges for inline elemental characterization at 65 nm node and beyond
Author
Godwin, Milton
Author_Institution
ISMI SEMATECH, Austin, TX, USA
fYear
2005
fDate
13-15 Sept. 2005
Firstpage
487
Lastpage
490
Abstract
A survey of current laboratory techniques for elemental analysis was conducted that included interviews with tool owners, in situ observation of operating platforms, and available references. Comparative analysis was performed using multi-variable spider charts that tracked techniques with the largest desirable areas of performance based on differing relative capabilities. Performance analysis indicates replacements for SEM/EDS that are also activated by e-beam illumination.
Keywords
X-ray chemical analysis; electron beam applications; integrated circuit manufacture; scanning electron microscopy; EDS; SEM; e-beam illumination; elemental analysis; inline elemental characterization; multivariable spider charts; Chemical analysis; Chemical elements; Laboratories; Lighting; Mass spectroscopy; Raman scattering; Sampling methods; Scanning electron microscopy; Transmission electron microscopy; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Print_ISBN
0-7803-9143-8
Type
conf
DOI
10.1109/ISSM.2005.1513413
Filename
1513413
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