DocumentCode
2093413
Title
Efficient characterization of millimetric TW FET´s with finite metallization
Author
Rozzi, T. ; Gerini, G. ; Farina, M.
Author_Institution
Dipartimento di Elettronica ed Automotica, UniversitÃ\xa0 degli Studi di Ancona, 60131 Ancona, ITALY. Tel.: +39 71 2204840; Fax: +39 71 898246; E-Mail rozzi@hpe101.cineca.it
fYear
1993
fDate
6-10 Sept. 1993
Firstpage
708
Lastpage
709
Abstract
In order to evaluate the propagation characteristics of distributed FET´s we have developed a rigorous and efficient field analysis technique, that is particularly suited for CAD applications to lossy planar circuits with finite metallization. This approach allowed us to compute the accurate dispersion curves of a totally asymmetric three-conductor structure with finite electrode thickness, metallic and dielectric losses by means of a desktop computer.
Keywords
Application software; Conductors; Dielectric losses; Eigenvalues and eigenfunctions; FETs; Integral equations; Metallization; Propagation constant; Propagation losses; Strips;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 1993. 23rd European
Conference_Location
Madrid, Spain
Type
conf
DOI
10.1109/EUMA.1993.336679
Filename
4136740
Link To Document