DocumentCode :
2093482
Title :
Integrating the SOI and poly-Si surface structures in a monolithic process for optical devices platform
Author :
Wu, Mingching ; Shy, Shiunafang ; Fang, Weileun
Author_Institution :
Power Mech. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear :
2003
fDate :
18-21 Aug. 2003
Firstpage :
63
Lastpage :
64
Abstract :
This work has successfully integrated thick single-crystal silicon (SCS) and thin film poly-Si microstructures on a SOI wafer using monolithic processes. Thus high optical quality micromirror and large output microactuators are available using the thick SOl wafer. Moreover, the poly-Si thin film microstructures serve as micro-hinges and stress-induced self-assembly mechanisms. The microstructures will be lifted and assembled by SixNy/poly-Si bimorph beams after releasing. This integrated process can substantially increase the feasibility of fabricating MEMS devices using SCS.
Keywords :
crystal microstructure; elemental semiconductors; integrated optics; microactuators; micromirrors; optical fabrication; semiconductor thin films; silicon; silicon-on-insulator; SCS micromirror; SOI wafer; Si; SixNy-Si; bimorph beam; integrated process; microhinges; monolithic process; optical devices platform; poly-Si surface structures; stress-induced self-assembly mechanisms; thick SCS microstructures; thin film poly-Si microstructures; Microactuators; Micromirrors; Microstructure; Optical devices; Optical films; Self-assembly; Semiconductor thin films; Silicon; Surface structures; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS, 2003 IEEE/LEOS International Conference on
Print_ISBN :
0-7803-7830-X
Type :
conf
DOI :
10.1109/OMEMS.2003.1233468
Filename :
1233468
Link To Document :
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