• DocumentCode
    2093482
  • Title

    Integrating the SOI and poly-Si surface structures in a monolithic process for optical devices platform

  • Author

    Wu, Mingching ; Shy, Shiunafang ; Fang, Weileun

  • Author_Institution
    Power Mech. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    2003
  • fDate
    18-21 Aug. 2003
  • Firstpage
    63
  • Lastpage
    64
  • Abstract
    This work has successfully integrated thick single-crystal silicon (SCS) and thin film poly-Si microstructures on a SOI wafer using monolithic processes. Thus high optical quality micromirror and large output microactuators are available using the thick SOl wafer. Moreover, the poly-Si thin film microstructures serve as micro-hinges and stress-induced self-assembly mechanisms. The microstructures will be lifted and assembled by SixNy/poly-Si bimorph beams after releasing. This integrated process can substantially increase the feasibility of fabricating MEMS devices using SCS.
  • Keywords
    crystal microstructure; elemental semiconductors; integrated optics; microactuators; micromirrors; optical fabrication; semiconductor thin films; silicon; silicon-on-insulator; SCS micromirror; SOI wafer; Si; SixNy-Si; bimorph beam; integrated process; microhinges; monolithic process; optical devices platform; poly-Si surface structures; stress-induced self-assembly mechanisms; thick SCS microstructures; thin film poly-Si microstructures; Microactuators; Micromirrors; Microstructure; Optical devices; Optical films; Self-assembly; Semiconductor thin films; Silicon; Surface structures; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS, 2003 IEEE/LEOS International Conference on
  • Print_ISBN
    0-7803-7830-X
  • Type

    conf

  • DOI
    10.1109/OMEMS.2003.1233468
  • Filename
    1233468