DocumentCode
2094228
Title
A high fill factor 1 × N spatial light modulator based on an epitaxial polysilicon process
Author
Dokmeci, M.R. ; Pareek, A. ; Kirkos, G. ; Bernstein, J.
Author_Institution
Corning Intellisense, Wilmington, MA, USA
fYear
2003
fDate
18-21 Aug. 2003
Firstpage
125
Lastpage
126
Abstract
This study introduces novel spatial light modulator (SLM) designs with flat micromirrors which require no etch release holes. A combination of surface micromachining and epitaxial polysilicon process is used in device fabrication. This process minimizes insertion loss since it is based on the requirements of MEMS based optical systems.
Keywords
elemental semiconductors; micromachining; micromechanical devices; micromirrors; optical design techniques; optical fabrication; optical losses; semiconductor epitaxial layers; silicon; spatial light modulators; MEMS based optical systems; SLM designs; device fabrication; epitaxial polysilicon process; fill factor; flat micromirrors; insertion loss; spatial light modulator; surface micromachining; Attenuation; Etching; Insertion loss; Micromachining; Micromechanical devices; Mirrors; Optical attenuators; Optical interferometry; Optical modulation; Optical sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS, 2003 IEEE/LEOS International Conference on
Print_ISBN
0-7803-7830-X
Type
conf
DOI
10.1109/OMEMS.2003.1233498
Filename
1233498
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