DocumentCode :
2096177
Title :
Fabrication and characterization of silicon photonic waveguides and devices via selective oxidation process
Author :
Xiaokun Wang ; Xiaowei Guan ; Yaocheng Shi ; Daoxin Dai
Author_Institution :
State Key Lab. for Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
fYear :
2012
fDate :
7-10 Nov. 2012
Firstpage :
1
Lastpage :
3
Abstract :
Silicon-on-insulator (SOI) optical waveguides are fabricated via selective oxidation process without any silicon etching step so that the waveguide surface becomes very smooth to achieve low-loss light propagation potentially. A high-Q ring-resonator is also demonstrated.
Keywords :
Q-factor; elemental semiconductors; integrated optics; optical fabrication; optical resonators; optical waveguides; oxidation; silicon; silicon-on-insulator; SOI; Si; high-Q ring-resonator; low-loss light propagation; selective oxidation process; silicon photonic waveguides; silicon-on-insulator;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications and Photonics Conference (ACP), 2012 Asia
Conference_Location :
Guangzhou
ISSN :
2162-108X
Print_ISBN :
978-1-4673-6274-0
Type :
conf
Filename :
6510892
Link To Document :
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