In-process optical characterization method for sub-100-nm nanostructures

Author

Kiess, Steffen ; Shaikh, M.Z. ; Grégoire, M. ; Bringewat, T. ; Simon, S. ; Tausendfreund, A. ; Zimmermann, M. ; Goch, G.

Author_Institution

Inst. of Parallel & Distrib. Syst., Univ. of Stuttgart, Stuttgart, Germany

fYear

2011

fDate

10-12 May 2011

Firstpage

1

Lastpage

4

Abstract

Optical measurements based on laser light scattering by nanostructures provide fast and contactless measurement of the surface of nanostructures for defects. In this paper, a novel in-process measurement method based on coherent laser light scattering by sub-100-nm structures is presented. It is shown that nanostructure defects can be identified by their unique scattering pattern. This is investigated by using modified algorithms of the discrete dipole approximation (DDA). Also hardware acceleration of the DDA algorithm on a General Purpose Graphical Processing Unit (GPGPU) platform shows a speedup of a factor of 5 over a high end CPU based platform.

Keywords

approximation theory; computer graphic equipment; coprocessors; measurement by laser beam; nanostructured materials; optical variables measurement; CPU based platform; DDA algorithm; GPGPU platform; contactless measurement; discrete dipole approximation; general purpose graphical processing unit platform; in-process optical characterization method; laser light scattering; nanostructures; optical measurements; size 100 nm; Graphics processing unit; Light scattering; Measurement by laser beam; Nanostructures; Surface topography; Surface treatment; DDA; Hardware Acceleration; In-process measurement; Simulation;

fLanguage

English

Publisher

ieee

Conference_Titel

Instrumentation and Measurement Technology Conference (I2MTC), 2011 IEEE

Conference_Location

Binjiang

ISSN

1091-5281

Print_ISBN

978-1-4244-7933-7

Type

conf

DOI

10.1109/IMTC.2011.5944117

Filename

5944117