Title :
Waveguide grating coupler based on CMOS poly-silicon gate layer
Author :
Chao Qiu ; Zhen Sheng ; Le Li ; Pang, Ai-Chun ; Aimin Wu ; Xi Wang ; Shichang Zou ; Fuwan Gan
Author_Institution :
State Key Lab. of Functional Mater. for Inf., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
Abstract :
Grating couplers based on CMOS poly-silicon gate layer are experimentally demonstrated with coupling efficiency of ~40%. By adding full-etched trenches in the waveguide layer, the coupling efficiency can be further improved to ~70%.
Keywords :
CMOS integrated circuits; diffraction gratings; elemental semiconductors; integrated optoelectronics; optical couplers; silicon; CMOS polysilicon gate layer; Si; coupling efficiency; full-etched trenches; waveguide grating coupler; waveguide layer;
Conference_Titel :
Communications and Photonics Conference (ACP), 2012 Asia
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4673-6274-0
