DocumentCode
2100823
Title
Microstructures for arrays of chemical gas sensors
Author
Popescu, Dan S. ; Dunare, Camelia ; Nedelcu, Oana ; Moagar, V. ; Babarada, Florin ; Dascalu, Dan C.
Author_Institution
Dept. of Electron., Univ. Politehnica Bucharest, Romania
Volume
1
fYear
1996
fDate
9-12 Oct 1996
Firstpage
113
Abstract
Design modelling and experiments have been made for a new type of microstructure for chemical gas sensors. Minimisation of the dissipated power losses, of the technological and temperature induced mechanical stresses in the suspended structure and of the thermal response for a dynamically thermal work of the sensor, have been the main goals. Thermal analysis using the finite difference method and the finite element method has been made. Analysis of the effects of the mechanical stresses in the deposited layers was performed and the stress distribution has been analysed. A simple technological sequence has been developed for the deposition of the sensitive layer on a beam type suspended structure by both sputtering and oxidation or by sol-gel methods
Keywords
CVD coatings; elemental semiconductors; gas sensors; semiconductor technology; silicon; sol-gel processing; sputter etching; stress analysis; thermal analysis; LPCVD; Si; Si-Si3N4; Si-SiO2; Si3N4; SiO2; arrays; beam type suspended structure; chemical gas sensors; dissipated power losses; dynamically thermal work; finite difference method; finite element method; mechanical stresses; microstructure; minimisation; modelling; oxidation; sol-gel methods; sputter deposition; sputtering; stress distribution; suspended structure; thermal analysis; thermal response; Chemical sensors; Chemical technology; Gas detectors; Mechanical sensors; Microstructure; Performance analysis; Sensor arrays; Temperature sensors; Thermal sensors; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 1996., International
Conference_Location
Sinaia
Print_ISBN
0-7803-3223-7
Type
conf
DOI
10.1109/SMICND.1996.557318
Filename
557318
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