DocumentCode
2101385
Title
Photoresponse of Ã\x9f-FeSi2 precipitates in a silicon waveguide
Author
Sun, C.M. ; Chan, P.S. ; Tsang, H.K.
Author_Institution
Chinese Univ. of Hong Kong, Shatin
fYear
2007
fDate
21-25 Oct. 2007
Firstpage
391
Lastpage
392
Abstract
beta-FeSi2 precipitates, with a band gap of ~0.8 eV, are formed by ion implantation into a silicon-on-insulator rib waveguide. A linear photocurrent of 1 muA was obtained from a p+-i-n+ structure under 3.16 mW incident power at 1550 nm.
Keywords
elemental semiconductors; iron compounds; optical waveguides; photoconductivity; silicon; Si; linear photocurrent; photoresponse; precipitates; silicon waveguide; Annealing; Iron; Optical waveguides; P-n junctions; Photoconductivity; Photodetectors; Photonic band gap; Silicon; Temperature; Waveguide discontinuities;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location
Lake Buena Vista, FL
ISSN
1092-8081
Print_ISBN
978-1-4244-0925-9
Electronic_ISBN
1092-8081
Type
conf
DOI
10.1109/LEOS.2007.4382443
Filename
4382443
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