Title :
EUV sources for Lithography
Author :
Richardson, Martin
Author_Institution :
Univ. of Central Florida, Orlando
Abstract :
Pressed by the demands of the impending implementation of Extreme UV Lithography at the end of the decade, several competing EUV light source technologies vie to capture a billion dollar market. Here we review this exciting competition.
Keywords :
ultraviolet lithography; ultraviolet sources; UV sources; extreme UV lithography; Fiber lasers; Laser theory; Lithography; Mirrors; Optical pulses; Plasma sources; Power lasers; Pump lasers; Solid lasers; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
978-1-4244-0925-9
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2007.4382489
