Title :
Theory of optimal pulse shaping for plasma processing
Author :
Vincent, Tyrone L. ; Raja, Laxminaryan L.
Author_Institution :
Eng. Div., Colorado Sch. of Mines, Golden, CO, USA
Abstract :
Thin film etching and deposition using low pressure plasma reactors is an integral part of the fabrication of VLSI circuits. This paper discusses the numerical calculation of periodic inputs to achieve desired operating conditions in low pressure plasma reactors. A gradient method is used to optimize the average value of state variables.
Keywords :
gradient methods; integrated circuit manufacture; optimal control; process control; sputter etching; thin film circuits; IC fabrication; VLSI; gradient method; optimal pulse shaping; plasma dynamic model; plasma reactors; thin film deposition; thin film etching; Etching; Fabrication; Gradient methods; Inductors; Plasma applications; Plasma materials processing; Pulse shaping methods; Sputtering; Thin film circuits; Very large scale integration;
Conference_Titel :
American Control Conference, 2002. Proceedings of the 2002
Print_ISBN :
0-7803-7298-0
DOI :
10.1109/ACC.2002.1025479
