• DocumentCode
    2103127
  • Title

    Tunneling and depletion-mode TFTs fabricated by low-temperature stress-assisted Cu-induced lateral growth and metal-free crystallization of germanium

  • Author

    Hekmatshoar, B. ; Mohajerzadeh, S. ; Shahrjerdi, D. ; Robertson, M.D.

  • Author_Institution
    ECE Dept., Tehran Univ., Iran
  • fYear
    2004
  • fDate
    21-23 June 2004
  • Firstpage
    87
  • Abstract
    Tunneling and depletion-mode poly-Ge TFTs were fabricated at temperatures as low as 150°C and 200°C respectively. Fabrication of the tunneling TFTs was based on stress-assisted lateral growth of Ge from Cu-seeded islands. In a different approach, depletion-mode TFTs were fabricated, based on metal-free crystallization of Ge by successive steps of hydrogenation and annealing.
  • Keywords
    copper; crystallisation; elemental semiconductors; germanium; hydrogenation; island structure; recrystallisation annealing; thin film transistors; tunnelling; 150 degC; 200 degC; Cu-seeded islands; Ge; Ge-Cu; annealing; depletion-mode TFT; hydrogenation; low-temperature stress-assisted copper-induced lateral growth; metal-free crystallization; tunneling TFT; Annealing; Compressive stress; Crystallization; Diffraction; Germanium; Hydrogen; Plasma temperature; Positron emission tomography; Substrates; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2004. 62nd DRC. Conference Digest [Includes 'Late News Papers' volume]
  • ISSN
    1548-3770
  • Print_ISBN
    0-7803-8284-6
  • Type

    conf

  • DOI
    10.1109/DRC.2004.1367796
  • Filename
    1367796