Title :
Novel structures enabling bulk switching in carbon nanotube FETs
Author :
Lin, Y.-M. ; Appenzeller, J. ; Avouris, Ph.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Abstract :
In order to alleviate the disadvantages associated with Schottky barriers in CNFETs, it is necessary to design CNFETs with bulk switching properties meaning that the bulk portion of the nanotube rather than the interface controls the CNFET characteristics. Here we present the first self-aligned bulk-switched CNFET that operates in the enhancement mode with a p-i-p (or n-i-n) doping profile along the tube. With our novel approach, we successfully fabricated CNFETs with excellent switching (S∼63 mV/dec), the smallest value reported for CNFETs so far, and very good performance in terms of their drain-induced-barrier-lowering (DIBL)-like behavior.
Keywords :
carbon nanotubes; doping profiles; field effect transistors; nanotube devices; C; DIBL; bulk switching; bulk-switched CNFET; carbon nanotube FET; drain-induced-barrier-lowering; enhancement mode operation; n-i-n doping profile; p-i-p doping profile; self-aligned CNFET; Artificial intelligence; Carbon nanotubes; Computer hacking; Doping profiles; Electrostatics; Etching; FETs; MOSFETs; Resists; Voltage;
Conference_Titel :
Device Research Conference, 2004. 62nd DRC. Conference Digest [Includes 'Late News Papers' volume]
Print_ISBN :
0-7803-8284-6
DOI :
10.1109/DRC.2004.1367820