DocumentCode :
2103758
Title :
An extended model for carbon nanotube field-effect transistors
Author :
Knoch, J. ; Mantl, S. ; Lin, Y.-M. ; Chen, Z. ; Avouris, Ph. ; Appenzeller, J.
Author_Institution :
Inst. for Thin Films & Interfaces, Forschungszentrum Julich GmbH, Germany
fYear :
2004
fDate :
21-23 June 2004
Firstpage :
135
Abstract :
In this paper, we present an extended Schottky barrier model that includes two new crucial aspects: i) current injection from the metal contacts into the channel does not occur directly but is mediated by the segment of the nanotube underneath the metal contacts whose density of states (DOS) is altered through the proximity of the metal (referred to in the following as "metal-modified" nanotube segment); and ii) the energy gap of carbon nanotubes with an average diameter of ∼1.4 nm seems to be rather ∼1.2 eV than ∼0.7 eV as typically assumed for these type of tubes. Our simulation allows us for the first time to quantitatively describe subthreshold characteristics of CNFETs over the entire gate voltage range.
Keywords :
Schottky barriers; carbon nanotubes; electronic density of states; energy gap; field effect transistors; nanotube devices; semiconductor device models; 0.7 eV; 1.2 eV; 1.4 nm; C; CNFET model; CNFET subthreshold characteristics; Schottky barrier model; carbon nanotube energy gap; carbon nanotube field-effect transistors; channel metal contact current injection; density of states; metal-modified nanotube segment; CNTFETs; Carbon nanotubes; Dispersion; Gold; Information technology; MOSFETs; Photonic band gap; Schottky barriers; Thin film transistors; Titanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2004. 62nd DRC. Conference Digest [Includes 'Late News Papers' volume]
ISSN :
1548-3770
Print_ISBN :
0-7803-8284-6
Type :
conf
DOI :
10.1109/DRC.2004.1367821
Filename :
1367821
Link To Document :
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