DocumentCode :
2104494
Title :
Effects of post-decoupled-plasma-nitridation annealing of ultra-thin gate oxide
Author :
Lek, Chun-Meng ; Cho, Byung Jin ; Loh, Wei Yip ; Ang, Chew-Hoe ; Lin, Wenhe ; Tan, Yun-Ling ; Zhen, Jia-Zheng ; Chan, Lap ; Tan, Shyue Seng ; Chen, Tu Pei
Author_Institution :
Silicon Nano Device Laboratory (SNDL)
fYear :
2002
fDate :
12-12 July 2002
Firstpage :
232
Lastpage :
236
Keywords :
Annealing; CMOS technology; Computer aided manufacturing; Drives; Helium; Laboratories; Nitrogen; Optical films; Plasma temperature; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2002. IPFA 2002. Proceedings of the 9th International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
0-7803-7416-9
Type :
conf
DOI :
10.1109/IPFA.2002.1025669
Filename :
1025669
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2104494
