Optically FlatMicromirror Designs Using Stretched Membrane with Crystallization-Induced Stress

Author

Sasaki, Minoru ; Sasaki, Takashi ; Hane, Kazuhiro ; Miura, Hideo

Author_Institution

Toyota Technol. Inst., Nagoya

fYear

2007

fDate

21-25 Oct. 2007

Firstpage

709

Lastpage

710

Abstract

The flat and light-weighted micromirror is realized using the tense poly-Si membrane across a rigid c-Si drum. The tensile stress of ~600 MPa is obtained using the crystallization of a-Si. The yield ratio depends on the design. The membrane profile is found to depend on the process sequence relating to the timing of the crystallization. The mirror satisfies the optical flatness <lambda/10 for the visible light. The peak-to-valley distance of ~20 mn is realized in the best design. The mirror flatness is stable against the temperature even though the mirror is metalized.

Keywords

crystallisation; membranes; micromirrors; silicon; stress effects; Si; crystallization-induced stress; light-weighted micromirror; optical flatness; optically flat micromirror; peak-to-valley distance; poly-Si membrane; rigid c-Si drum; stretched membrane; tensile stress; Biomembranes; Crystallization; Etching; Micromirrors; Mirrors; Optical design; Optical films; Temperature; Tensile stress; Thermal stresses; amorphous; crystallization; micromirror; optical flatness; tensile stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE

Conference_Location

Lake Buena Vista, FL

ISSN

1092-8081

Print_ISBN

978-1-4244-0925-9

Electronic_ISBN

1092-8081

Type

conf

DOI

10.1109/LEOS.2007.4382604

Filename

4382604