Title :
Topolithography and its application to the manufacture of 3D diode-based memories
Author_Institution :
Nup2, North Hampton, NH, USA
Abstract :
Topolithography is a process wherein all of the information necessary to define a circuit is applied to a substrate in a single step. A multilevel surface topology defines the circuit for subsequent self-assembly so no photolithographic steps are required to manufacture a circuit resulting in substantially reduced costs. A transistor-less memory circuit is designed where high density storage, address decoding and I/O are implemented using an array of diodes.
Keywords :
integrated memory circuits; lithography; read-only storage; self-assembly; semiconductor diodes; surface topography; 3D diode-based memories; I/O; address decoding; circuit definition; high density storage; multilevel surface topology; self-assembly; single step process; substrate; topolithography; transistor-less memory circuit; Circuits; Decoding; Dielectrics; Lithography; Manufacturing; Material storage; Power distribution; Semiconductor diodes; Substrates; Voltage;
Conference_Titel :
Solid-State Circuits Conference, 2003. Digest of Technical Papers. ISSCC. 2003 IEEE International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-7707-9
DOI :
10.1109/ISSCC.2003.1234338