Title :
Equipment Simulation - State Of The Art And Future Challenges
Author_Institution :
SIEMENS
Keywords :
Chemical reactors; Chemical technology; Differential equations; Hydrodynamics; Inductors; Manufacturing processes; Plasma temperature; Semiconductor device manufacture; Virtual manufacturing; Viscosity;
Conference_Titel :
VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
Print_ISBN :
0-7803-1338-0
DOI :
10.1109/VPAD.1993.724701
