• DocumentCode
    2109557
  • Title

    A New Method For Simulation Of Etching And Deposition Processes

  • Author

    Strasser, E. ; Wimmer, K. ; Selberherr, S.

  • Author_Institution
    Technical University of Vienna
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    54
  • Lastpage
    55
  • Keywords
    Algebra; Anisotropic magnetoresistance; Etching; Geometry; Microelectronics; Morphological operations; Semiconductor device modeling; Spatial filters; Surface morphology; Surface topography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724720
  • Filename
    724720
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2109557