DocumentCode :
2109842
Title :
Material Representations And Algorithms For Nanometer-scale Lithography Simulation
Author :
Scheckler, E.W. ; Ogawa, T. ; Shukuri, S. ; Takeda, E.
Author_Institution :
Hitachi Ltd.
fYear :
1993
fDate :
14-15 May 1993
Firstpage :
56
Lastpage :
57
Keywords :
Data structures; Integral equations; Lithography; Partitioning algorithms; Plasma simulation; Polymers; Resists; Rough surfaces; Surface roughness; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
Print_ISBN :
0-7803-1338-0
Type :
conf
DOI :
10.1109/VPAD.1993.724721
Filename :
724721
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2109842
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