• DocumentCode
    2109842
  • Title

    Material Representations And Algorithms For Nanometer-scale Lithography Simulation

  • Author

    Scheckler, E.W. ; Ogawa, T. ; Shukuri, S. ; Takeda, E.

  • Author_Institution
    Hitachi Ltd.
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    56
  • Lastpage
    57
  • Keywords
    Data structures; Integral equations; Lithography; Partitioning algorithms; Plasma simulation; Polymers; Resists; Rough surfaces; Surface roughness; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724721
  • Filename
    724721
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2109842