Title :
Feature-scale Modeling And Characterization Of Oxide APCVD
Author_Institution :
Intel Corporation
Keywords :
Atmospheric modeling; Chemical vapor deposition; Electrodes; Equations; Fluid flow; Process control; Scattering; Surface treatment;
Conference_Titel :
VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
Print_ISBN :
0-7803-1338-0
DOI :
10.1109/VPAD.1993.724727
