DocumentCode
2111949
Title
Improved charge pump for flash memory applications in triple well CMOS technology
Author
Khouri, O. ; Gregori, Stefano ; Cabrini, Alessandro ; Micheloni, Rino ; Torelli, Guido
Author_Institution
Memory Product Group R&D, ST Microelectron., Pavia
Volume
4
fYear
2002
fDate
2002
Firstpage
1322
Abstract
Flash memories, which are key components for non-volatile storage in many portable applications, require high voltages for correct operation. These voltage have to be generated by using on-chip voltage elevators. This paper presents an improved scheme for charge-pump voltage elevators suitable for use in triple-well CMOS fabrication technology. A direct drain-bulk connection is realized for the pass transistor which implements the charge transfer device in each pump stage. This results in placing a P-N diode in parallel with the pass transistor, thereby improving the charge transfer process between adjacent stages. The proposed charge pump provides smaller output resistance (and, hence, larger current drive capability and shorter recovery time) and higher power efficiency as compared to conventional solutions. An experimental comparison between two charge pump modules (based on the traditional and on the presented scheme, respectively) integrated in 0.13-μm CMOS Flash technology, demonstrated the effectiveness of the proposed approach.
Keywords
CMOS memory circuits; flash memories; semiconductor diodes; 0.13 micron; P-N diode; charge pump improvement; charge transfer device; charge transfer process; direct drain-bulk connection; flash memory; on-chip voltage elevators; pass transistor; triple-well CMOS technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Industrial Electronics, 2002. ISIE 2002. Proceedings of the 2002 IEEE International Symposium on
Print_ISBN
0-7803-7369-3
Type
conf
DOI
10.1109/ISIE.2002.1025982
Filename
1025982
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