Title :
Overview of X-ray lithography at IBM using a compact storage ring
Author :
Maldonado, Juan R.
Author_Institution :
IBM, Hopewell Junction, NY, USA
Abstract :
Feasibility studies being conducted of the use of X-ray lithography for the production of high-density silicon chips are discussed. The system approach to X-ray lithography adopted considers the interaction of all the components-X-ray source, masks, resists, and exposure tools-with the devices and processes. In particular, the status of the Advanced Lithography Facility which houses the electron storage ring X-ray source is presented.<>
Keywords :
X-ray lithography; electron accelerators; masks; storage rings; Advanced Lithography Facility; X-ray lithography; electron storage ring X-ray source; exposure tools; masks; resists; Contracts; Electrons; Production; Pulp manufacturing; Resists; Silicon; Storage rings; Throughput; X-ray lasers; X-ray lithography;
Conference_Titel :
Particle Accelerator Conference, 1991. Accelerator Science and Technology., Conference Record of the 1991 IEEE
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-0135-8
DOI :
10.1109/PAC.1991.164360
