• DocumentCode
    2112927
  • Title

    Evaluation Of Two-dimensional Transient Enhanced Diffusion Of Phosphorus During Shallow Junction Formation

  • Author

    Sato, Hisako ; Tsuneno, Katsumi ; Masuda, Hiroo

  • Author_Institution
    Hitachi,Ltd.
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    86
  • Lastpage
    87
  • Keywords
    Acceleration; Analytical models; Fabrication; Furnaces; Implants; Semiconductor process modeling; Simulated annealing; Tail; Temperature dependence; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724732
  • Filename
    724732
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2112927