Title :
Real-time control of reactive ion etching: identification and disturbance rejection
Author :
Rashap, B.A. ; Khargonekar, P.P. ; Grizzle, J.W. ; Elta, M.E. ; Freudenberg, J.S. ; Terry, E.L., Jr.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Abstract :
The main processes involved in the manufacture of integrated circuits are deposition, lithography, etching, and implantation. This paper describes results on identification and real-time control of reactive ion etchers. Experimental results show that significant disturbances to the etch rate can be attenuated with real-time feedback control
Keywords :
feedback; identification; integrated circuit manufacture; process computer control; process control; real-time systems; sputter etching; disturbance rejection; etch rate; identification; integrated circuits; reactive ion etching; real-time feedback control; Etching; Feedback control; Laboratories; Manufacturing processes; Open loop systems; PD control; Pi control; Plasma applications; Pressure control; Weight control;
Conference_Titel :
Decision and Control, 1993., Proceedings of the 32nd IEEE Conference on
Conference_Location :
San Antonio, TX
Print_ISBN :
0-7803-1298-8
DOI :
10.1109/CDC.1993.325839
