DocumentCode :
2113396
Title :
Defect-free fabrication of periodic structures using extreme ultraviolet Talbot lithography
Author :
Li, Wenyuan ; Martinez-Esquiroz, V. ; Urbanski, L. ; Patel, Dinesh ; Menoni, C.S. ; Marconi, Mario ; Stein, Aaron
Author_Institution :
Electr. & Comput. Eng. Dept., Colorado State Univ., Fort Collins, CO, USA
fYear :
2013
fDate :
8-12 Sept. 2013
Firstpage :
635
Lastpage :
636
Abstract :
We present a defect-free scalable nano-patterning scheme based on the Talbot effect with extreme ultraviolet laser illumination.
Keywords :
Talbot effect; nanofabrication; nanolithography; nanopatterning; periodic structures; photoresists; ultraviolet lithography; Talbot effect; defect-free fabrication; defect-free scalable nanopatterning; extreme ultraviolet Talbot lithography; extreme ultraviolet laser illumination; periodic structures; Diffraction; Fabrication; Lithography; Resists; Talbot effect; Tiles; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics Conference (IPC), 2013 IEEE
Conference_Location :
Bellevue, WA
Print_ISBN :
978-1-4577-1506-8
Type :
conf
DOI :
10.1109/IPCon.2013.6656455
Filename :
6656455
Link To Document :
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