DocumentCode
2113453
Title
Engineering the optical constants of sputtered amorphous silicon films by crystallization with rapid thermal annealing
Author
Amin, Md Syedul ; Hozhabri, Nader ; Magnusson, Robert
Author_Institution
Dept. of Electr. Eng., Univ. of Texas at Arlington, Arlington, TX, USA
fYear
2013
fDate
8-12 Sept. 2013
Firstpage
639
Lastpage
640
Abstract
We engineer the complex refractive index n+ik of sputtered amorphous silicon by rapid thermal annealing. An order-of-magnitude reduction of the extinction coefficient k is achieved.
Keywords
amorphous semiconductors; crystallisation; elemental semiconductors; extinction coefficients; rapid thermal annealing; refractive index; semiconductor thin films; silicon; sputtered coatings; Si; complex refractive index; crystallization; extinction coefficient; optical constants; order-of-magnitude reduction; rapid thermal annealing; sputtered amorphous silicon films; Annealing; Optical films; Optical refraction; Optical variables control; Refractive index; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics Conference (IPC), 2013 IEEE
Conference_Location
Bellevue, WA
Print_ISBN
978-1-4577-1506-8
Type
conf
DOI
10.1109/IPCon.2013.6656457
Filename
6656457
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