DocumentCode :
2116098
Title :
Fabrication of semiconductor nanoparticles using electro spray deposition method
Author :
Doe, Takahiro ; Horita, Masahiro ; Nishida, Takashi ; Ishikawa, Yasuaki ; Uraoka, Yukiharu
Author_Institution :
Nara Inst. of Sci. & Technol., Ikoma, Japan
fYear :
2011
fDate :
19-20 May 2011
Firstpage :
32
Lastpage :
33
Abstract :
ZnS semiconductor nanoparticles were fabricated using electro spray process. We chose the electro spray deposition (ESD) method which is one of a particle preparation process from spray pyrolysis route. The ESD method, which produces nano-size droplets, combined with the evaporation of solvent of nano droplets can fabricate nanoparticle whose size are controlled to single nano order size and behave a quantum confinement effect. We successfully obtained 3.7 nm as the average size and 2.3 nm as the FWHM by precise controlled for the nozzle tip size and the applied voltage to 25 μm and 2.3 kV, respectively.
Keywords :
II-VI semiconductors; electrodeposition; materials preparation; nanofabrication; nanoparticles; pyrolysis; semiconductor growth; wide band gap semiconductors; zinc compounds; ESD method; FWHM; ZnS; electrospray deposition method; nanosize droplets; nozzle tip size; particle preparation process; quantum confinement effect; semiconductor nanoparticle fabrication; size 2.3 nm; size 25 mum; size 3.7 nm; spray pyrolysis route; voltage 2.3 V; Electrostatic discharge; Materials; Nanoparticles; Potential well; Printing; Spraying; Voltage control; Electro spray; Printing process; Semiconductor nanoparticles; ZnS;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Future of Electron Devices, Kansai, (IMFEDK), 2011 International Meeting for
Conference_Location :
Osaka
Print_ISBN :
978-1-61284-145-8
Electronic_ISBN :
978-1-61284-147-2
Type :
conf
DOI :
10.1109/IMFEDK.2011.5944830
Filename :
5944830
Link To Document :
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