• DocumentCode
    2118269
  • Title

    Mathematical Analysis of O and OH Radicals Energized by Dielectric Barrier Discharge

  • Author

    Yin, Shui-e ; Sun, Bao-Min ; Lee, Fei

  • Author_Institution
    Educ. Minist. Key Lab. on Condition Monitoring & Control of Power Plant Equip., North China Electr. Power Univ., Beijing, China
  • fYear
    2010
  • fDate
    28-31 March 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, a mathematical model was proposed to describe the behavior of OH and O radicals in the Dielectric Barrier Discharge (DBD) of NO/SO2/O2/H2O/N2 system with a cylindrical reactor, which energized by repetitive high voltage pulses at normal atmospheric pressure and room temperature. The generation and consumption of the radials were considered in the mathematical model by a single pulse or continuous pulses. Their concentrations were derived by considering the direct electron effect on the dissociation of gaseous molecules (O2, N2, H2O) and the subsequent excitation transfer reaction of excited oxygen atoms to produce OH radicals. The proposed equations were solved numerically by Rosenbrock method in MATLAB.
  • Keywords
    discharges (electric); dissociation; free radical reactions; numerical analysis; oxygen; oxygen compounds; plasma chemistry; reaction kinetics theory; MATLAB; NO-SO2-O2-H2O-N2; NO/SO2/O2/H2O/N2 system; O; O radicals; OH; OH radicals; Rosenbrock method; cylindrical reactor; dielectric barrier discharge; direct electron effect; excitation transfer reaction; excited oxygen atoms; gaseous molecule dissociation; mathematical model; pressure 1 atm; repetitive high voltage pulses; temperature 293 K to 298 K; Atomic measurements; Dielectrics; Electrons; Equations; Inductors; Mathematical analysis; Mathematical model; Pulse generation; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power and Energy Engineering Conference (APPEEC), 2010 Asia-Pacific
  • Conference_Location
    Chengdu
  • Print_ISBN
    978-1-4244-4812-8
  • Electronic_ISBN
    978-1-4244-4813-5
  • Type

    conf

  • DOI
    10.1109/APPEEC.2010.5449432
  • Filename
    5449432