DocumentCode
2119825
Title
Strengths, Weaknesses, Opportunities and Threats of the Post-Silicon Technologies
Author
Coffa, S.
Author_Institution
STMicroelectron., Catania
fYear
2007
fDate
2-5 Oct. 2007
Firstpage
11
Lastpage
12
Abstract
The unique characteristics of novel technological platforms, using different substrates, such as SiC, GaN, plastic, and introducing thin film processing of non-conventional materials, e.g. polymers or small organic molecules, offer the promise of widespread application in several areas, ranging from light and robust displays, to low cost photovoltaics, or to flexible radio-frequency identification (RF-ID) circuitry. This talk discusses the challenges launched by the scientific community operating in the field of the post-Si technology, and specifically by STMicroelectronics, to give an impetus for advances in materials and processing development.
Keywords
elemental semiconductors; integrated circuit manufacture; integrated circuit technology; semiconductor thin films; silicon; substrates; technology management; RFID; STMicroelectronics; Si; Si - Element; photovoltaics; post-Si technology; post-silicon technologies; radio-frequency identification circuitry; substrates; thin film processing; Costs; Displays; Gallium nitride; Organic materials; Plastic films; Polymer films; Robustness; Silicon carbide; Substrates; Thin film circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors, 2007. RTP 2007. 15th International Conference on
Conference_Location
Catania, Sicily
Print_ISBN
978-1-4244-1228-0
Electronic_ISBN
978-1-4244-1228-0
Type
conf
DOI
10.1109/RTP.2007.4383812
Filename
4383812
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