• DocumentCode
    2119825
  • Title

    Strengths, Weaknesses, Opportunities and Threats of the Post-Silicon Technologies

  • Author

    Coffa, S.

  • Author_Institution
    STMicroelectron., Catania
  • fYear
    2007
  • fDate
    2-5 Oct. 2007
  • Firstpage
    11
  • Lastpage
    12
  • Abstract
    The unique characteristics of novel technological platforms, using different substrates, such as SiC, GaN, plastic, and introducing thin film processing of non-conventional materials, e.g. polymers or small organic molecules, offer the promise of widespread application in several areas, ranging from light and robust displays, to low cost photovoltaics, or to flexible radio-frequency identification (RF-ID) circuitry. This talk discusses the challenges launched by the scientific community operating in the field of the post-Si technology, and specifically by STMicroelectronics, to give an impetus for advances in materials and processing development.
  • Keywords
    elemental semiconductors; integrated circuit manufacture; integrated circuit technology; semiconductor thin films; silicon; substrates; technology management; RFID; STMicroelectronics; Si; Si - Element; photovoltaics; post-Si technology; post-silicon technologies; radio-frequency identification circuitry; substrates; thin film processing; Costs; Displays; Gallium nitride; Organic materials; Plastic films; Polymer films; Robustness; Silicon carbide; Substrates; Thin film circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Thermal Processing of Semiconductors, 2007. RTP 2007. 15th International Conference on
  • Conference_Location
    Catania, Sicily
  • Print_ISBN
    978-1-4244-1228-0
  • Electronic_ISBN
    978-1-4244-1228-0
  • Type

    conf

  • DOI
    10.1109/RTP.2007.4383812
  • Filename
    4383812