Title :
Applied Materials´ Product Portfolio and Roadmap
Author :
Hunter, Aaron ; Zelenko, Jeremy ; Mani, Rajesh
Author_Institution :
Appl. Mater., Sunnyvale
Abstract :
Applied materials played a pivotal role in the commercial acceptance of rapid thermal processing (RTP) within the semiconductor industry, largely by solving the problem of precisely measuring and controlling the temperature of silicon. Today, our RTP-based products are used for processes as varied as radical oxidation, gate oxide engineering, metal silicide annealing, and ultra shallow junction annealing spanning the temperature range from 240degC to over 1200degC. The next generation RTP - millisecond annealing - is following the same trends by providing the most production worthy yet technically capable tool in the world.
Keywords :
annealing; elemental semiconductors; oxidation; rapid thermal annealing; semiconductor device manufacture; silicon; applied materials; gate oxide engineering; metal silicide annealing; millisecond annealing; oxidation; rapid thermal processing; semiconductor industry; ultrashallow junction annealing; Electronics industry; Oxidation; Portfolios; Rapid thermal annealing; Rapid thermal processing; Semiconductor materials; Silicides; Silicon; Temperature control; Temperature distribution;
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2007. RTP 2007. 15th International Conference on
Conference_Location :
Catania, Sicily
Print_ISBN :
978-1-4244-1228-0
Electronic_ISBN :
978-1-4244-1228-0
DOI :
10.1109/RTP.2007.4383813
