• DocumentCode
    2119997
  • Title

    A New Semi-empirical Model For Amorphous Silicon Thin-film-transistors

  • Author

    Aoki, Hitoshi ; Khalily, Ebrahim

  • Author_Institution
    Hewlett Packard Company
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    138
  • Lastpage
    139
  • Keywords
    Amorphous silicon; Capacitance; Circuit simulation; Integrated circuit modeling; Intrusion detection; State feedback; Stress; Temperature; Thin film transistors; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724758
  • Filename
    724758
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2119997