• DocumentCode
    2121028
  • Title

    Anomalous Short-channel Body Coefficients Due To Transient Enhanced Diffusion

  • Author

    Rafferty, C.S. ; Giles, MD ; Vuong, H.H. ; Eshraghi, S.A. ; Pinto, MR ; Hillenius, SJ

  • Author_Institution
    AT&T Bell Labs
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    148
  • Lastpage
    149
  • Keywords
    Boron; Doping profiles; Implants; Impurities; MOSFET circuits; Oxidation; Predictive models; Rapid thermal annealing; Semiconductor process modeling; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724763
  • Filename
    724763