DocumentCode :
2121326
Title :
High Efficiency and Power Ion Implanted MESFET Devices
Author :
Bastida, E.M. ; Antolini, P. ; Castelli, A. ; Donzelli, G.P. ; Gabbrielli, B. ; Longari, C. ; Rasà, F. ; Scopelliti, L.
Author_Institution :
ALCATEL TELETTRA, Via Trento 30, 20059 Vimercate, MI, Italy.
Volume :
2
fYear :
1994
fDate :
5-9 Sept. 1994
Firstpage :
1137
Lastpage :
1142
Abstract :
The paper describes how through proper new process features power FET devices with surprisingly increased power and efficiency have been recently produced. In particular the power added efficiency reach values higher than those expected from standard literature relationships. The reasons of this fact are discussed.
Keywords :
Annealing; FETs; Fabrication; Frequency; MESFETs; Ohmic contacts; Power measurement; Surface treatment; Transconductance; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 1994. 24th European
Conference_Location :
Cannes, France
Type :
conf
DOI :
10.1109/EUMA.1994.337366
Filename :
4138412
Link To Document :
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