DocumentCode
2122265
Title
InP HBT and HEMT technology and applications
Author
Oki, A.K. ; Streit, D.C. ; Lai, R. ; Gutierrez-Aitken, A. ; Chen, Y.C. ; Grundbacher, R. ; Grossman, P.C. ; Block, T. ; Chin, P. ; Barsky, M. ; Sawdai, D. ; Wojtowicz, M. ; Kaneshiro, E. ; Yen, H.C.
Author_Institution
TRW Inc., Redondo Beach, CA, USA
fYear
2000
fDate
2000
Firstpage
7
Lastpage
8
Abstract
The performance and cost advantages of gallium arsenide (GaAs) based heterojunction bipolar transistor (HBT) and high electron mobility transistor (HEMT) technology has enabled several high volume commercial applications. TRW is currently delivering over 4 million MBE based GaAs HBT and HEMT integrated circuits per month for several commercial applications, as well as for high performance high reliability defense avionics, ground, and space applications. Indium phosphide (InP) based technologies have several enabling advantages over GaAs technologies for commercial communication applications, in particular for high efficiency mobile cellular, broadband millimeter wave point-to-point links, high speed fiber-optics, and satellite telecommunications
Keywords
HEMT integrated circuits; III-V semiconductors; bipolar integrated circuits; heterojunction bipolar transistors; indium compounds; integrated circuit technology; HBT; HEMT; InP; MBE; commercial communication applications; indium phosphide; integrated circuit technology; Aerospace electronics; Costs; Gallium arsenide; HEMTs; Heterojunction bipolar transistors; Indium phosphide; Integrated circuit technology; MODFETs; Millimeter wave technology; Space technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location
Williamsburg, VA
ISSN
1092-8669
Print_ISBN
0-7803-6320-5
Type
conf
DOI
10.1109/ICIPRM.2000.850216
Filename
850216
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