DocumentCode
2123694
Title
Integrated CAD System for an MMIC using Symbolic Layout
Author
Sasaki, Yoshinobu ; Tanino, Noriyuki ; Mitsui, Shigeru
Author_Institution
Optoelectronic & Microwave Devices Laboratory, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, 664, JAPAN. Tel: +81 727 84 7384 Fax: +81 727 80 2694
Volume
2
fYear
1994
fDate
5-9 Sept. 1994
Firstpage
1616
Lastpage
1621
Abstract
In this paper, a microwave symbolic layout is proposed as an interface between a circuit simulation and a mask pattern. This system is separated from the design of process oriented design rules allowing a designer to design a circuit without understanding the complicated MMIC process. An automatic conversion program has been also developed to convert from a mricrowave symbolic layout to a mask pattern. Using this system, a designer can consistently go from the circuit design operation to the mask data creation.
Keywords
Circuit simulation; Design automation; FETs; Inductors; Libraries; MIM capacitors; MMICs; Microwave devices; Parameter extraction; Process design;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 1994. 24th European
Conference_Location
Cannes, France
Type
conf
DOI
10.1109/EUMA.1994.337449
Filename
4138495
Link To Document