Title :
Integrated CAD System for an MMIC using Symbolic Layout
Author :
Sasaki, Yoshinobu ; Tanino, Noriyuki ; Mitsui, Shigeru
Author_Institution :
Optoelectronic & Microwave Devices Laboratory, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, 664, JAPAN. Tel: +81 727 84 7384 Fax: +81 727 80 2694
Abstract :
In this paper, a microwave symbolic layout is proposed as an interface between a circuit simulation and a mask pattern. This system is separated from the design of process oriented design rules allowing a designer to design a circuit without understanding the complicated MMIC process. An automatic conversion program has been also developed to convert from a mricrowave symbolic layout to a mask pattern. Using this system, a designer can consistently go from the circuit design operation to the mask data creation.
Keywords :
Circuit simulation; Design automation; FETs; Inductors; Libraries; MIM capacitors; MMICs; Microwave devices; Parameter extraction; Process design;
Conference_Titel :
Microwave Conference, 1994. 24th European
Conference_Location :
Cannes, France
DOI :
10.1109/EUMA.1994.337449
