Title :
InP and InAlP self-assembled quantum dots grown by metalorganic chemical vapor deposition
Author :
Ryou, Jae-Hyun ; Dupuis, Russell D. ; Reddy, C.V. ; Narayanamurti, Venkatesh ; Mathes, David T. ; Hull, Robert
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
Abstract :
We report the characteristics of InP self-assembled quantum dots embedded in In0.5Al0.5P on GaAs substrates and In xAl1-xP self-assembled quantum dots on GaP substrates grown by metalorganic chemical vapor deposition. InP quantum dots show increased average dot sizes and decreased dot densities, as the growth temperature increases from 475C to 600C. At 650C, however, dramatically smaller and densely distributed quantum dots are formed. The InP quantum dots grown at 650C are dislocation-free “coherent” self-assembled quantum dots with an average size of ~20 nm (height) and a density of ~1.5×108 mm-2 . These InP quantum dots have broad range of luminescence corresponding to red or orange in the visible spectrum. InAlP quantum dots on GaP have smaller sizes and higher densities than InP dots on In 0.5Al0.5P
Keywords :
III-V semiconductors; MOCVD coatings; aluminium compounds; indium compounds; semiconductor growth; semiconductor quantum dots; 20 nm; 475 to 600 C; InAlP; InP; average dot sizes; decreased dot densities; metalorganic chemical vapor deposition; self-assembled quantum dots; Chemical vapor deposition; Gallium arsenide; Indium phosphide; Lattices; MOCVD; Quantum dot lasers; Quantum dots; Substrates; Temperature; US Department of Transportation;
Conference_Titel :
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location :
Williamsburg, VA
Print_ISBN :
0-7803-6320-5
DOI :
10.1109/ICIPRM.2000.850272