• DocumentCode
    2123833
  • Title

    Measurement of CVD thin films thickness by sample weighing method

  • Author

    Modreanu, M. ; Cosmin, P. ; Cosmin, S. ; Cobianu, C. ; Dunare, C.

  • Author_Institution
    Inst. of Microtechnol., Bucharest, Romania
  • Volume
    2
  • fYear
    1996
  • fDate
    9-12 Oct 1996
  • Firstpage
    409
  • Abstract
    Several type of films obtained by the Chemical Vapour Deposition technique, such as silicon dioxide, phosphosilicate glass, silicon oxynitride, silicon nitride and polysilicon, were investigated. A calibration technique for the sample weighing method comprising film density evaluation was developed. The sample weighing method was found to be a fast, precise and non-destructive method for thin film thickness evaluation
  • Keywords
    CVD coatings; calibration; density measurement; insulating thin films; semiconductor thin films; thickness measurement; weighing; CVD thin film thickness measurement; P2O5-SiO2; PSG; Si; Si3N4; SiO2; SiON; calibration technique; film density evaluation; nondestructive method; phosphosilicate glass; polysilicon; sample weighing method; Chemical vapor deposition; Nitrogen; Optical films; Refractive index; Semiconductor films; Silicon compounds; Sputtering; Temperature; Thickness measurement; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 1996., International
  • Conference_Location
    Sinaia
  • Print_ISBN
    0-7803-3223-7
  • Type

    conf

  • DOI
    10.1109/SMICND.1996.557407
  • Filename
    557407
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2123833