Title :
Measurement of CVD thin films thickness by sample weighing method
Author :
Modreanu, M. ; Cosmin, P. ; Cosmin, S. ; Cobianu, C. ; Dunare, C.
Author_Institution :
Inst. of Microtechnol., Bucharest, Romania
Abstract :
Several type of films obtained by the Chemical Vapour Deposition technique, such as silicon dioxide, phosphosilicate glass, silicon oxynitride, silicon nitride and polysilicon, were investigated. A calibration technique for the sample weighing method comprising film density evaluation was developed. The sample weighing method was found to be a fast, precise and non-destructive method for thin film thickness evaluation
Keywords :
CVD coatings; calibration; density measurement; insulating thin films; semiconductor thin films; thickness measurement; weighing; CVD thin film thickness measurement; P2O5-SiO2; PSG; Si; Si3N4; SiO2; SiON; calibration technique; film density evaluation; nondestructive method; phosphosilicate glass; polysilicon; sample weighing method; Chemical vapor deposition; Nitrogen; Optical films; Refractive index; Semiconductor films; Silicon compounds; Sputtering; Temperature; Thickness measurement; Transistors;
Conference_Titel :
Semiconductor Conference, 1996., International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-3223-7
DOI :
10.1109/SMICND.1996.557407
