Title :
CBC reduction in GaInAs/InP buried metal heterojunction bipolar transistor
Author :
Arai, T. ; Harada, Y. ; Yamagami, S. ; Miyamoto, Y. ; Furuya, K.
Author_Institution :
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Japan
Abstract :
We fabricated GaInAs/InP based buried metal heterojunction bipolar transistors (BM-HBTs), in which a tungsten stripe with the same area as the emitter was buried with an intrinsic collector layer. In this device, there was no conductive layer under the extrinsic base region to reduce the total base-collector capacitance (CBCT). Though tungsten was embedded in an active region of HBTs, flat surface of base layer and no void formation around buried tungsten were confirmed by the observation of cross section. CBCT of 10.3 fF was calculated from Y12 parameters and an effective base-collector junction area of BM-HBT was estimated at 22% of conventional-HBT
Keywords :
III-V semiconductors; buried layers; capacitance; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor device measurement; tungsten; 10.3 fF; CBC reduction; GaInAs-InP; GaInAs/InP based buried metal heterojunction bipolar transistors; GaInAs/InP buried metal heterojunction bipolar transistor; HBT; W; base-collector capacitance; effective base-collector junction area; emitter; extrinsic base region; intrinsic collector layer; tungsten stripe; Capacitance; Conductivity; Epitaxial growth; Fabrication; Heterojunction bipolar transistors; Indium phosphide; Substrates; Tungsten; Wires; Wiring;
Conference_Titel :
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location :
Williamsburg, VA
Print_ISBN :
0-7803-6320-5
DOI :
10.1109/ICIPRM.2000.850280