DocumentCode
2123974
Title
CBC reduction in GaInAs/InP buried metal heterojunction bipolar transistor
Author
Arai, T. ; Harada, Y. ; Yamagami, S. ; Miyamoto, Y. ; Furuya, K.
Author_Institution
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Japan
fYear
2000
fDate
2000
Firstpage
254
Lastpage
257
Abstract
We fabricated GaInAs/InP based buried metal heterojunction bipolar transistors (BM-HBTs), in which a tungsten stripe with the same area as the emitter was buried with an intrinsic collector layer. In this device, there was no conductive layer under the extrinsic base region to reduce the total base-collector capacitance (CBCT). Though tungsten was embedded in an active region of HBTs, flat surface of base layer and no void formation around buried tungsten were confirmed by the observation of cross section. CBCT of 10.3 fF was calculated from Y12 parameters and an effective base-collector junction area of BM-HBT was estimated at 22% of conventional-HBT
Keywords
III-V semiconductors; buried layers; capacitance; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor device measurement; tungsten; 10.3 fF; CBC reduction; GaInAs-InP; GaInAs/InP based buried metal heterojunction bipolar transistors; GaInAs/InP buried metal heterojunction bipolar transistor; HBT; W; base-collector capacitance; effective base-collector junction area; emitter; extrinsic base region; intrinsic collector layer; tungsten stripe; Capacitance; Conductivity; Epitaxial growth; Fabrication; Heterojunction bipolar transistors; Indium phosphide; Substrates; Tungsten; Wires; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location
Williamsburg, VA
ISSN
1092-8669
Print_ISBN
0-7803-6320-5
Type
conf
DOI
10.1109/ICIPRM.2000.850280
Filename
850280
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