DocumentCode :
2124935
Title :
A light addressing electrochromic device
Author :
Yanzhong, Xu ; Qiu Muqing ; Naipin, Li ; Guangjun, Cao ; Sanqin, Liu
Author_Institution :
Dept. of Solid State Electron., Huazhong Univ. of Sci. & Technol., Hubei, China
Volume :
2
fYear :
1996
fDate :
9-12 Oct 1996
Firstpage :
575
Abstract :
A novel electrochromic device structure is proposed in the study of the electrochromic information memory properties. A high resistive amorphous silicon dot is intercalated between the working electrochromic layer and the electronic electrode. Focused light beam can be applied to switch on the high resistive dot, hence the memory spots are addressed in two dimensional space
Keywords :
electrochromic devices; optical storage; Si; amorphous silicon dot; focused light beam; information memory; light addressing electrochromic device; two dimensional addressing; Amorphous silicon; Electrochromic devices; Electrochromism; Electrodes; Glass; Optical films; Optical sensors; Semiconductor films; Solid state circuits; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 1996., International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-3223-7
Type :
conf
DOI :
10.1109/SMICND.1996.557450
Filename :
557450
Link To Document :
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